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Home/Compounds/Electronic Chemical/Trimethylaluminum
C3H9Al
72.09 g/mol
Electronic ChemicalDanger

Trimethylaluminum

CAS75-24-1EC200-853-0
Category
Electronic Chemical
Compound Class
Organometallic
Primary Use
Semiconductor thin film growth precursor

Trimethylaluminum is an organoaluminum compound that exists as a dimer and is a colorless, pyrophoric liquid. It is primarily used as a precursor in semiconductor thin film growth processes.

Precursor for semiconductor thin film growthSource of aluminum in chemical vapor deposition

Content scope: Information here supports chemical identification and industrial supply, research, and manufacturing contexts. It is not a therapeutic claim, medical advice, or drug-use instructions.

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Safety Reference

Flammable
Flammable
Corrosive
Corrosive
Danger
H250Catches fire spontaneously if exposed to air
H260In contact with water releases flammable gases which may ignite spontaneously
H314Causes severe skin burns and eye damage
H318Causes serious eye damage
Identifiers
IUPAC Name

trimethylalumane

InChIKey

JLTRXTDYQLMHGR-UHFFFAOYSA-N

SMILES

C[Al](C)C

Synonyms (23)
  • Al(Me)3
  • Aluminum trimethanide
  • Aluminum, trimethyl-
  • TRIMETHYLALUMINUM (AL(CH3)3)
  • Trimethylalane
  • Trimethylaluminum
  • Trimethylaluminum, elec. gr.
  • trimethyaluminium
  • trimethyaluminum
  • trimethyl aluminium
  • trimethylaiuminium
  • trimethylalumane
  • trimethylalumimum
  • trirnethylaluminium