N-Hydroxynaphthalimide triflate is a photoacid generator used in photoresist formulations for semiconductor manufacturing. It is a non-polymer PFAS compound that generates acid upon exposure to light, enabling pattern formation in photoresist layers.
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IRIDIUM-BIS[5-FLUORO-2-(5-METHYL-2-PYRIDINYL-KappaN)PHENYL-KappaC](1,10-PHENANTHROLINE-KappaN1,KappaN10)-(OC-6-13)-HEXAFLUOROPHOSPHATE
phosphorescent iridium complex for OLED
9H-Carbazole-3-boronic acid pinacol ester
OLED materials intermediate
N-phenyl-2-Dibenzofuranamine
Electronic chemical intermediate
1,6-Diisopropyl-3,8-dibromopyrene
electronic chemical intermediate
Perfluorobutyl 1,3-dioxo-1H-benzo[de]isoquinoline-2(3H)-sulfonate
Sulfonate ester reagent
Solvent Yellow 43
Solvent dye for plastics and inks
Tetrakis((2S)-2-(1,3-dioxobenzo[de]isoquinolin-2-yl)-3,3-dimethylbutanoate);bis(rhodium(2+))
research reagent
Amonafide
pharmaceutical raw material
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Read more(1,3-dioxobenzo[de]isoquinolin-2-yl) trifluoromethanesulfonate
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