F6W
297.83 g/mol
Electronic ChemicalDanger
Tungsten hexafluoride
CAS7783-82-6EC232-029-1
Category
Electronic Chemical
Compound Class
Halocarbon
Primary Use
Tungsten chemical vapor deposition source
Tungsten hexafluoride is a tungsten compound primarily used as a source for tungsten deposition in chemical vapor deposition processes. It is significant in the electronics industry for forming tungsten interconnects within semiconductor devices.
Tungsten coating via chemical vapor depositionSource of tungsten metal for semiconductor interconnects
Content scope: Information here supports chemical identification and industrial supply, research, and manufacturing contexts. It is not a therapeutic claim, medical advice, or drug-use instructions.
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CAS 7783-82-6
Related Compounds
StrongSame Parent
Tungsten hexachloride
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Tungsten coatings and vapor deposition
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Silicon source for semiconductor deposition
Safety Reference
Danger
H280Contains gas under pressure; may explode if heated
H301Toxic if swallowed
H311Toxic in contact with skin
H314Causes severe skin burns and eye damage
H318Causes serious eye damage
H330Fatal if inhaled
Identifiers
IUPAC Name
hexafluorotungsten
InChIKey
NXHILIPIEUBEPD-UHFFFAOYSA-H
SMILES
F[W](F)(F)(F)(F)F
Synonyms (12)
- Hexafluorotungsten
- TUNGSTEN HEXAFLUORIDE (WF6)
- TUNGSTEN(6+) FLUORIDE
- Tungsten fluoride
- Tungsten fluoride (WF6)
- Tungsten hexafluoride
- Tungsten(6+) hexafluoride
- Tungsten(VI) fluoride
- WOLFRAM HEXAFLUORIDE