Octafluoroadipic acid is a fluorinated dicarboxylic acid used as a top antireflective coating in semiconductor lithography. Its structure features two carboxylic acid groups and eight fluorine atoms, contributing to its utility in electronic chemical applications.
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CAS 336-08-3
Trimethylindium
semiconductor manufacturing precursor
2,2'-Bis(trifluoromethyl)benzidine
battery materials intermediate
1-chloro-4-(3-phenylphenyl)benzene
Electronic chemical intermediate
1-Bromo-9-fluorenone
OLED material intermediate
2,2,3,3,4,4,5,5-octafluorohexanedioic acid
AXRSOGFYDSXLQX-UHFFFAOYSA-N
C(=O)(C(C(C(C(C(=O)O)(F)F)(F)F)(F)F)(F)F)O