C12H9F13O2
432.18 g/mol
Electronic ChemicalWarning
Tridecafluorohexylethyl methacrylate
CAS2144-53-8EC218-407-9
Category
Electronic Chemical
Compound Class
Ester
Primary Use
Photoresist component for semiconductor manufacturing
Tridecafluorohexylethyl methacrylate is a fluorinated methacrylate monomer used as a photoresist component in semiconductor manufacturing. Its highly fluorinated structure contributes to improved etch resistance and optical properties in photolithographic processes.
Photoresist component for semiconductor manufacturingPhotosensitizer for photoresists
Content scope: Information here supports chemical identification and industrial supply, research, and manufacturing contexts. It is not a therapeutic claim, medical advice, or drug-use instructions.
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CAS 2144-53-8
Related Compounds
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Safety Reference
Warning
H315Causes skin irritation
H319Causes serious eye irritation
H335May cause respiratory irritation
H373May cause damage to organs through prolonged or repeated exposure
H410Very toxic to aquatic life with long lasting effects
Identifiers
IUPAC Name
3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl 2-methylprop-2-enoate
InChIKey
CDXFIRXEAJABAZ-UHFFFAOYSA-N
SMILES
CC(=C)C(=O)OCCC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F
Synonyms (19)
- ACTYFLON G 06B
- CAPSTONE 62MA
- CHEMINOX FAMAC 6
- FAMAC 6
- FLUOWET MA 600