This compound is a zirconium coordination complex with four tetramethylheptanedionate ligands, used as a volatile metal precursor in thin-film deposition processes. It is primarily employed in research and laboratory settings for chemical vapor deposition or atomic layer deposition applications.
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Sourcing Tetrakis(2,2,6,6-tetramethylheptane-3,5-dionato)zirconium?
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tetrakis(2,2,6,6-tetramethylheptane-3,5-dione);zirconium(4+)
MOOILSXNGBFZKZ-UHFFFAOYSA-N
CC(C)(C)C(=O)[CH-]C(=O)C(C)(C)C.CC(C)(C)C(=O)[CH-]C(=O)C(C)(C)C.CC(C)(C)C(=O)[CH-]C(=O)C(C)(C)C.CC(C)(C)C(=O)[CH-]C(=O)C(C)(C)C.[Zr+4]
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Sourcing Tetrakis(2,2,6,6-tetramethylheptane-3,5-dionato)zirconium?
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