N-Hydroxynaphthalimide triflate is a photoacid generator used in photoresist formulations for semiconductor manufacturing. It is a non-polymer PFAS compound that generates acid upon exposure to light, enabling pattern formation in photoresist layers.
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CAS 85342-62-7
IRIDIUM-BIS[5-FLUORO-2-(5-METHYL-2-PYRIDINYL-KappaN)PHENYL-KappaC](1,10-PHENANTHROLINE-KappaN1,KappaN10)-(OC-6-13)-HEXAFLUOROPHOSPHATE
phosphorescent iridium complex for OLED
3-(4,4,5,5-Tetramethyl-1,3,2-dioxaborolan-2-yl)carbazole
OLED materials intermediate
N-phenyl-2-Dibenzofuranamine
Electronic chemical intermediate
1,6-dibromo-3,8-diisopropylpyrene
electronic chemical intermediate
Perfluorobutyl 1,3-dioxo-1H-benzo[de]isoquinoline-2(3H)-sulfonate
sulfonate ester reagent
2-butyl-6-(butylamino)-1H-benzo[de]isoquinoline-1,3(2H)-dione
Solvent dye for plastics and inks
Tetrakis((2S)-2-(1,3-dioxobenzo[de]isoquinolin-2-yl)-3,3-dimethylbutanoate);bis(rhodium(2+))
n.a
Amonafide
topoisomerase II inhibitor
(1,3-dioxobenzo[de]isoquinolin-2-yl) trifluoromethanesulfonate
LWHOMMCIJIJIGV-UHFFFAOYSA-N
C1=CC2=C3C(=C1)C(=O)N(C(=O)C3=CC=C2)OS(=O)(=O)C(F)(F)F
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