This compound is a sulfonium salt photoacid generator used in photoresist formulations for semiconductor manufacturing. It generates acid upon exposure to light, enabling the chemical amplification process critical for high-resolution lithography.
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CAS 89452-37-9
Sulfonium, (thiodi-4,1-phenylene)bis[diphenyl-, bis[hexafluorophosphate(1-)]
photoacid generator
Diphenyl(4-(phenylthio)phenyl)sulfonium hexafluoroantimonate
Photoinitiator for cationic polymerization
9-(4-Biphenylyl)-3-bromocarbazole
Electronic chemical intermediate
N-(BIPHENYL-4-YL)-9,9-DIMETHYL-9H-FLUOREN-2-AMINE
OLED intermediate
4-(3-phenylphenyl)-N-[4-(3-phenylphenyl)phenyl]aniline
Electronic chemical
Bis(4-(naphthalen-1-yl)phenyl)amine
Organic semiconductor intermediate
[4-(4-diphenylsulfoniophenyl)sulfanylphenyl]-diphenylsulfanium;bis(hexafluoroantimony(1-))
DREXYWKFHDOSNT-UHFFFAOYSA-B
C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=C(C=C3)SC4=CC=C(C=C4)[S+](C5=CC=CC=C5)C6=CC=CC=C6.F[Sb-](F)(F)(F)(F)F.F[Sb-](F)(F)(F)(F)F
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